NanoCrystal :nano-devices & materials

Application scenarios
 >>Research on the characteristics of metamaterials
 >>Nanometer lens,Holographic lens preparation
 >>Naked eye 3D display of nanometer light guide plate
 >>Preparation of photonic crystal array
 >>Study on nano-scale back light source displayed in naked eye 3D
 >>Lithographic study of other complex nanostructures
 >>Nano substrate of LED/OLED
 >>Hologram
 >>Diffractive Optics
 

Technical features
 >>The phase splitter mode air frequency is continuously set at 150nm-5μm
 >>A large numerical aperture uv interferometer optical system is used
 >>With high speed and high performance, the field of view reaches 100um
 >>Flight exposure high speed lithography
 >>3D navigation automatically focuses
 >>Support GDSII, DXF, BMP and other file formats

Customer value
 >>Preparation of periodic micro-nano structures at subwavelength scale
 >>High cost-effective products, small footprint complete functions
 >>Allow customers to have large uneven base, reduce the base material requirements



Customer value


 

 

Keywords:  high efficiency nano-pattening
 
1. Features of NanoCrystal
 
NanoCrystal is specially designed for nano-patterning of meta-surface, nano-devices and materaials with resolution of 100nm.
 
NanoCrystal has been installed with 5 axis controller for realizing the four-parameter adjustion of micro-nano-structures in the optical field. The feature size, the direction and coordination of micro-nano-structures can be definated and written by NanoCrystal. The accuracy of adjusting structure in the optical field can be achieved up to 0.1nm.  
 
The main feature of NanoCrystal
  1. Arbitarary changing of grating period continuously from 10um to 100nm for grating array or large format grating fabrication. 
  2. Arbitarary changing of orientation of grating continuously in 360 degree, for nano-device fabrication. 
  3. The hololens, Fresnel lens array and meta-surface can be made with any focusing length defination and orientation defination. 
  4. The size of pixel exposed and structure in each pixel can be changed according to design precisely.


NanoCrystal can make the arbitarary gratings and curve devices at a wounderful speed that 500 times faster than that of e-beam lithography for the same patterns so that the NanoCrysatl is a advanced tool for patterning of large size structures with high efficiency with the cutting-edge technolgy.


2. Samples of NanoCrysatal